Year: 2024
Type: article
Abstract: Challenges of EUV lithography include the development of resists with high resolution, high sensitivity, low line-width roughness, and low outgassing. Thus, our research group has developed various evaluation systems installed at the NewSUBARU synchrotron radiation facility and promoted research for EUV lithography. In particular, BL03 is a beamline specialized for EUV flood exposure for 4-inch wafer and used to evaluate sensitivity and outgassing of resists.
Institution: University of Hyogo
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: diamond
OpenAlex ID: W4406789633