Work

Wavelength dependence of thermoreflectance coefficient of TiNi thin film

Year: 2025

Type: article

Abstract: The temperature dependence of the reflectance of TiNi thin films was measured using a developed temperature modulation-free thermoreflectance measurement equipment integrated with a precise temperature control system. Consequently, the temperature dependence of the reflectance was successfully measured at three wavelengths with uncertainties confined to within ±3% at 80 °C. In addition, a very low temperature dependence of the reflectance of the order of 10−6 [1 °C−1] was confirmed. The linearity uncertainty of the temperature dependence of the reflectance was evaluated and determined to be within ±15.52%.

Source: Japanese Journal of Applied Physics

DOI: 10.35848/1347-4065/adb299

Authors: Taichi Murakami, Masaki Shimofuri, Toshiyuki Tsuchiya, Shugo Miyake

Institutions: Setsunan University, Kyoto University

Language: English

Topic: Calibration and Measurement Techniques

Subfield: Aerospace Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: bronze

Funder: Japan Society for the Promotion of Science

Award: Toward understanding surface-to-surface contact - Measurement of physical phenomena using cleavage nanogaps