Work

Low-temperature growth of wafer-scale amorphous boron nitride films with low-dielectric-constant and controllable thicknesses

Year: 2025

Type: article

Source: Nanotechnology

DOI: 10.1088/1361-6528/adb293

Authors: Hang Zheng, Zihao Wan, Wenna Tang, Xianlei Huang, Zhenjia Zhou, Weilin Liu, Chao Wang, Guowen Yuan, Libo Gao

Institutions: Collaborative Innovation Center of Advanced Microstructures, National Laboratory of Solid State Microstructures, Nanjing University

Language: English

Topic: Copper Interconnects and Reliability

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funder: National Natural Science Foundation of China

Awards: G1129002754, G7532474611

OpenAlex ID: W4407163326

FWCI: 0.318

Cites: 44

Cited by: 2

Related to: 10