Work

Deposition and Degradation Mechanism of Zinc Thiolate Thin Films via Hybrid Molecular Layer Deposition

Year: 2025

Type: article

Source: Chemistry of Materials

DOI: 10.1021/acs.chemmater.4c02571

Authors: Jacqueline Lewis, Jingwei Shi, Andreas Werbrouck, Stacey F. Bent

Institution: Stanford University

Language: English

Topic: Advanced Materials and Semiconductor Technologies

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funders: National Science Foundation, National Science Foundation Graduate Research Fellowship Program

Awards: NNCI: nano@stanford, Nanoscale Control over Surface Functionalization by Molecular Layer Deposition, G880926405

OpenAlex ID: W4407206554

FWCI: 1.462

Cites: 44

Cited by: 7

Related to: 10