Work

A method for measuring individual ion density in an Ar/He mixture inductively coupled plasma

Year: 2025

Type: article

Source: Plasma Sources Science and Technology

DOI: 10.1088/1361-6595/adb3ca

Authors: Jin-Ung Son, Moo-Hyun Lee, Min-Seok Kim, Jiwon Jung, Beom-Jun Seo, Ju-Ho Kim, Chin-Wook Chung

Institution: Hanyang University

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Ministry of Trade, Industry and Energy, Korea Semiconductor Research Consortium

Awards: G626722953, G7902031766, G880266526

OpenAlex ID: W4407250315

FWCI:

Cites: 50

Cited by:

Related to: 10