Work

Stress-Related Local Layout Effects in FinFET Technology and Device Design Sensitivity

Year: 2025

Type: article

Source: IEEE Transactions on Semiconductor Manufacturing

DOI: 10.1109/tsm.2025.3540267

Authors: Angelo Rossoni, Tomasz Brozek, Sharad Saxena, Rajesh Khamankar, Luigi Colalongo, Zsolt M. Kovacs-Vajna

Institutions: PDF Solutions (United States), University of Brescia

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4407316370

FWCI: 1.386

Cites: 19

Cited by: 6

Related to: 10