Work

Controlling the Composition of Mo–Si–N–O Thin Films in Reactive Magnetron Sputtering

Year: 2024

Type: article

Source: Russian Microelectronics

DOI: 10.1134/s1063739724700902

Authors: D. G. Gromov, S. A. Gavrilov, E. A. Lebedev, M. V. Silibin, S. V. Dubkov, A. V. Anikin, A. I. Pogalov, D. A. Dronova, D. D. Butmanov, M. E. Shiryaev, V. D. Gromov, R. M. Ryazanov, R. A. Sharipov, V. A. Bespalov

Institutions: Sechenov University, National Research University of Electronic Technology

Language: English

Topic: Metal and Thin Film Mechanics

Subfield: Mechanics of Materials

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4407336444

FWCI:

Cites: 27

Cited by:

Related to: 10