Work

Plasma Parameters and Etching Kinetics of Si/SiO2 in Mixtures of Fluorocarbon Gases with Argon and Helium

Year: 2024

Type: article

Source: Russian Microelectronics

DOI: 10.1134/s1063739724600535

Authors: A. M. Efremov, V. B. Betelin, K.-H. Kwon

Institutions: Research Institute of Molecular Electronics, Russian Academy of Sciences, Korea University

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4407336782

FWCI: 0.104

Cites: 31

Cited by: 1

Related to: 10