Work

Effects of Induced Structural Modification on Properties of V+ Ion-Implanted RF—Magnetron Sputtering Deposited ZnO Thin Films of Thickness 120 nm on Borosilicate Glass Substrates

Year: 2025

Type: article

Abstract: The influence of structural modifications on the thermal stability, chemical bonds, and optical properties of zinc oxide (ZnO) thin films (120 nm thick) for optoelectronic devices (solar cells, LEDs) and energy nanodevices was investigated. The films, synthesized via rf-magnetron sputtering, were implanted with V+ ions at 170 keV with varying fluences. Optical properties, including bandgap, transmittance, and absorbance, were analyzed using UV–Vis spectroscopy, XRD, AFM, and FTIR. Structural changes such as strain, lattice constant, surface roughness, and crystallite size significantly influenced the optical properties. Increased surface roughness led to a higher optical bandgap (up to 4.10 eV) and transmittance (82.34%), with reduced absorbance (0.12 nm). Crystallite size exhibited similar effects. At an ion fluence of 1 × 1016 ions/cm2, the bandgap and transmittance increased, while absorbance slightly decreased. Thermal stability and chemical bond analysis supported these findings. The study demonstrates that V+ ion-induced modifications enhance ZnO thin films’ properties, highlighting their potential for advanced optoelectronic and energy nanodevice applications.

Source: Nanomaterials

DOI: 10.3390/nano15040278

Authors: Olakunle Oluwaleye, Bonex Wakufwa Mwakikunga, Joseph K. O. Asante

Institutions: Tshwane University of Technology, Council for Scientific and Industrial Research

Language: English

Topic: ZnO doping and properties

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: gold

Estimated APC paid: $2,896

Funder: National Research Foundation