Work

Investigation of FinFET with Multi-Channel Structures on Device Characteristics

Year: 2024

Type: conference-paper

Source: IEEE International Conference of Electron Devices Society Kolkata Chapter (EDKCON)

DOI: 10.1109/edkcon62339.2024.10870759

Authors: Archana, Manish Verma, Dhandapani Vaithiyanathan

Institution: National Institute of Technology Delhi

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4407467192

FWCI:

Cites: 18

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Related to: 10