Work

Performance Analysis of a Heterojunction Dual Gate Ferroelectric Tunnel FET with Variation of Gate Stack Dielectric combination

Year: 2024

Type: conference-paper

Source: IEEE International Conference of Electron Devices Society Kolkata Chapter (EDKCON)

DOI: 10.1109/edkcon62339.2024.10870750

Authors: Shib Sankar Das, Sudipta Ghosh, Subir Kumar Sarkar

Institutions: Jadavpur University, Meghnad Saha Institute of Technology

Language: English

Topic: Ferroelectric and Negative Capacitance Devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDGs: Affordable and clean energy, Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4407467931

FWCI: 1.612

Cites: 21

Cited by: 2

Related to: 10