Work

Optimization of Doping Profile in Carbon Nanotube Field Effect Transistor

Year: 2024

Type: conference-paper

Source: IEEE International Conference of Electron Devices Society Kolkata Chapter (EDKCON)

DOI: 10.1109/edkcon62339.2024.10870749

Authors: Shuvra Jyoti Bose, Sneha Singh, Rudra Sankar Dhar

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4407475727

FWCI: 0.779

Cites: 26

Cited by: 1

Related to: 10