Work

Enhancing chemical vapor deposition growth and fabrication techniques to maximize hole conduction in tungsten diselenide for monolithic CMOS integration

Year: 2025

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/6.0003893

Authors: Jatin Vikram Singh, Matthew N. Disiena, S. S. Teja Nibhanupudi, Nicholas T. Watanabe, JaeHyun Ahn, Dong-Won Kim, Anupam Roy, Sanjay K. Banerjee

Institutions: The University of Texas at Austin, Samsung (South Korea), Samsung Electronics (South Korea), Birla Institute of Technology, Mesra

Language: English

Topic: 2D Materials and Applications

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funder: Science and Engineering Research Board

Award: G4813944404

OpenAlex ID: W4407532845

FWCI:

Cites: 44

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Related to: 10