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The Challenges and Solutions to the Development of Light Shielding Mask Glass from Design Phase to Process Optimization for CMOS Image Sensors

Year: 2024

Type: conference-paper

DOI: 10.1109/iemt61324.2024.10875303

Authors: May May Gan, Ying Heong Chiew, Kok Inn Hoo, Teck Siang Lim

Language: English

Topic: Advanced machining processes and optimization

Subfield: Mechanical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4407575404

FWCI:

Cites: 5

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Related to: 10