Hierarchical super-hydrophobic coating with productive etching process and self-assembled Ag mask
Year: 2025
Type: article
Abstract: Optical coating to maintain clear views in harsh environments is a vital technology to meet the increasing demand for vision assistance cameras or fully automated vehicles. In this study, the hierarchical nanostructured super-hydrophobic coating was fabricated without an expensive lithography process. First, the self-assembled Ag nano-mask was deposited on top of the SiO2 layer instead of a lithography-patterned nano-mask. Next, isotropic etching to carve the SiO2 layer and anisotropic etching to reshape the Ag nano-mask were alternatively applied to create a well-controlled hierarchical nanostructure of SiO2 in one process. The size and pitch of the nanostructure were optimized by the deposition condition of Ag and the etching condition of Ag to gradually re-shape the Ag mask during the etching process. These techniques have achieved a productive etching process to form a rigid hierarchical nanostructure on a lens surface without a lithography technique.
Authors: Kazunari Tada, Tatsuya Naito, Yuji Honda
Institutions: Konica Minolta (Japan), Honda (Japan)
Language: English
Subfield: Surfaces, Coatings and Films
Field: Materials Science
Domain: Physical Sciences
Open Access status: hybrid
Estimated APC paid: $2,210
OpenAlex ID: W4407607264