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Nonstoichiometric Nickel Oxide Films Deposited by SILAR Method on Flexible Polyimide Substrates

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Year: 2024
Type: conference-paper
Source: IEEE KhPI Week on Advanced Technology (KhPIWeek)
DOI: 10.1109/khpiweek61434.2024.10878006
Authors: Natalia Klochko, Volodymyr Kopach, Dmytro Zhadan, Sergey Petrushenko, Kinga Adach, Sergei Dukarov
Institutions: National Technical University "Kharkiv Polytechnic Institute", Technical University of Liberec, V. N. Karazin Kharkiv National University
Language: English

Topic: Nanomaterials and Printing Technologies
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences

Open Access status: closed
OpenAlex ID: W4407628336
FWCI:
Cites: 10
Cited by:
Related to: 10
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