Work

Crystalline NiO films by hollow-cathode plasma-enhanced atomic layer deposition: Material properties and heterojunction device performance

Year: 2025

Type: article

Source: Journal of Alloys and Compounds

DOI: 10.1016/j.jallcom.2025.179279

Authors: Fatih Bayansal, Saidjafarzoda Ilhom, Yusuf Selim Ocak, John Grasso, Brian G. Willis, Necmi Biyikli

Institutions: University of Connecticut, Morgan State University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: bronze

Funders: U.S. Department of Energy, Office of Science, School of Civil, Environmental and Mining Engineering, University of Adelaide, Fusion Energy Sciences

Award: G7395615782

OpenAlex ID: W4407673232

FWCI: 0.924

Cites: 69

Cited by: 4

Related to: 10