Throughput and Quality Optimized Down-Selection of Overlay Measurement Markers for Robust Control of the Maximum Overlay Error in a Pattern Layer in Photolithography Processes
Year: 2025
Type: article
Authors: Noah Graff, Dragan Djurdjanovic
Institution: The University of Texas at Austin
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4407690805