Nanostructured Chromium PVD Thin Films Fabricated Through Copper–Chromium Selective Dissolution
Year: 2025
Type: article
Abstract: This study investigates the fabrication of nanostructured chromium thin films via selective dissolution of PVD-deposited Cu-Cr thin films. The effects of the deposition parameters on the structural, chemical, and morphological properties of the films are systematically analyzed. Starting from a thin film composed of 50 wt.% chromium and 50 wt.% copper, deposited onto a substrate pre-heated to 300 °C, we demonstrate that the following dealloying process carried out in a diluted nitric acid solution yields nanostructured chromium films with high porosity, large surface area, enhanced wettability and neglectable copper content. These findings underline the critical influence of the deposition temperature and alloy composition on achieving optimal film properties.
Source: Materials
DOI: 10.3390/ma18040894
Language: English
Topic: Nanoporous metals and alloys
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: gold
Estimated APC paid: $3,137
Awards: G1585674959, G482427013
OpenAlex ID: W4407694159