Preparation and microstructure of BaTiO3 thin films by RF magnetron sputtering
Year: 2025
Type: conference-paper
Abstract: The preparation of high-quality films is a key challenge in building high-performance electro-optic modulators and achieving ultra-high-speed optical communication. In this research, we used magnetron sputtering to precisely prepare BaTiO3 thin films on SrTiO3 substrates, and systematically studied the effects of process parameters on their crystallinity and microstructure. Under optimized process conditions—a sputtering power of 60 W, chamber pressure of 1.0 Pa, argon-oxygen ratio of 6:1, substrate temperature of 350 °C, and a sputtering duration of 60 minutes—the thin film exhibited a <200> preferred orientation, a grain size of 38.7 nm, X-ray diffraction <200> half-peak full width is 0.288°, and demonstrated high crystalline quality and microstructural order. This research provides scientific evidence for the preparation of high-performance electro-optic modulator materials and has important academic and practical value for the development of Si-based photonic integration technology.
Institution: Hubei University of Technology
Language: English
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: diamond
OpenAlex ID: W4407768615