Work

Application of new development technology to ultra-narrow pitch patterns formed by electron beam lithography

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051148

Authors: Hikari Tomori, Kayoko Cho, Cong Que Dinh, Makoto Muramatsu

Institution: Tokyo Electron Kyushu Ltd (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4407832714

FWCI:

Cites: 20

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Related to: 10