Enhancement of etching properties using pulsed inductively coupled plasma for high aspect ratio TiO₂ pillars in metalens fabrication
Year: 2025
Type: conference-abstract
DOI: 10.1117/12.3050591
Authors: Sumin Ho, Heeju Kim, Min Cheol Kim, Jong Woo Hong, Geun Young Yeom
Institution: Sungkyunkwan University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4407832769