Work

Dual-function filtration to improve on-wafer defectivity performance for EUV applications

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3050213

Authors: Masahiko Kubo, Byron Huang, Allen Wu, Vanessa Su

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4407832827

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Cites: 1

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Related to: 10