Work

Innovative optical crosslinking process on PFAS-free underlayers for enhanced sustainability in EUV lithography

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051231

Authors: Seungjoo Baek, Elke Caron, Wesley Zanders, Andreia Santos, Masahiko Harumoto, Seonggil Heo, Jelle Vandereyken, Hyo Seon Suh, Veerle Driessche, Douglas J. Guerrero

Institutions: IMEC, Brewer Science (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDGs: Industry, innovation and infrastructure, Affordable and clean energy, Responsible consumption and production, Climate action

Open Access status: closed

OpenAlex ID: W4407832836

FWCI: 4.554

Cites: 7

Cited by: 2

Related to: 10