Work

Study on the influence of hardmask morphology on substrate profile in plasma etching process

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3050913

Authors: Yuzhang Lei, Ziyi Hu, Yuxuan Zhai, Hua Shao, Junjie Li, Rui Chen, Jiang Yan

Institutions: North China University of Technology, Institute of Microelectronics

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4407832907

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Cites: 9

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Related to: 10