Enhancement of ion directionality for vertical profiles and mask damage suppression by biasing the bottom of mask
Year: 2025
Type: conference-paper
DOI: 10.1117/12.3055108
Authors: Lee Wooyoung, Junyoung Park, Jung-Eun Choi, Chin-wook Chung
Institution: Hanyang University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4407832913