Work

Exploration of UPE membrane technology in point-of-use EUV CAR photoresist filtration

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051101

Authors: Tetsu Kohyama, Nadia Vandenbroeck, Philippe Foubert

Institution: IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4407832917

FWCI:

Cites: 3

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Related to: 10