Work

Photolithography process optimization: insights into negative tone resists and spray coating

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051472

Authors: Johanna Rimböck, Martin Weinhart, Jakob Holzapfel, Armin Schreiner, Matthias Brunnbauer, Madison Reum

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4407832949

FWCI:

Cites: 4

Cited by:

Related to: 10