A point of use filter with new pleats design for lithography applications
Year: 2025
Type: conference-paper
DOI: 10.1117/12.3050127
Authors: Hirokazu Sakakibara, Kenji Ebara, Ozal Yusuf, Sheik Ansar Usman Ibrahim, Ta-Wei Wu
Institution: Nihon Pall Ltd. (Japan)
Language: English
Subfield: Water Science and Technology
Field: Environmental Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4407832952