Work

Fundamental understanding of the development process for metal oxide photoresists

Year: 2025

Type: conference-abstract

DOI: 10.1117/12.3047803

Authors: Ankur Agarwal, Arnaud Dauendorﬀer, Ihsan Simms, Satoru Shimura, Yuichi Terashita, Michael Carcasi, Lior Huli, Cong Que Dinh, Hikari Tomori, Kayoko Cho, Naoki Shibata, Tetsunari Furusho

Institutions: Tokyo Electron (Japan), Tokyo Electron Kyushu Ltd (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4407832974

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