Impact of developer chemistry on EUV photolithography defects: PFAS vs. PFAS-free surfactants
Year: 2025
Type: conference-paper
DOI: 10.1117/12.3055211
Authors: Amit Ohri, Vineet Vijayakrishnan Nair, Dave Pratt, Scott Light, Brian Watson, Shruthi Vadivel
Institution: Micron (United States)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4407832983