Work

Challenges of photolithography processing on glass wafers within a 300mm CMOS wafer fab

Year: 2025

Type: conference-paper

Source: SPIE Novel Patterning Technologies

DOI: 10.1117/12.3052034

Authors: Stéphanie Audran, Mathieu Guerabsi, Franck Hudry, Simon Guillaumet

Institution: STMicroelectronics (France)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4407833123

FWCI:

Cites: 5

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Related to: 10