Work

Study on modeling of resist heating effect correction in multi-beam mask writers

Year: 2025

Type: conference-paper

Source: SPIE Novel Patterning Technologies

DOI: 10.1117/12.3050107

Authors: Haruyuki Nomura, Shingo Mori, Tomoo Motosugi

Institution: Nuflare Technology, Inc. (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4407833183

FWCI: 6.878

Cites: 5

Cited by: 3

Related to: 10