Work

Immersion interference lithography for realizing a large slant angle beyond the limit

Year: 2025

Type: conference-paper

Source: SPIE Novel Patterning Technologies

DOI: 10.1117/12.3051248

Authors: Yohei Nawaki, Kohei Toyoda, Kota Hiroshima, Toru Nomura, Kentaro Nomoto, Hirotaka Yamada, Kazuyuki Tsuruoka

Institution: Ushio (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4407833192

FWCI: 2.358

Cites:

Cited by: 1

Related to: 10