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Enhancing lithographic process latitude: a powerful approach using inverse lithography technology for depth of focus improvement

Year: 2025

Type: conference-paper

Source: SPIE Novel Patterning Technologies

DOI: 10.1117/12.3050623

Authors: Yen-Lung Lu, Szu-Ping Chen, Eric Huang, Chun-Cheng Liao, Gloria Yeh

Institution: Nanya Technology (Taiwan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4407833211

FWCI:

Cites: 2

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Related to: 10