Work

Strategies to extend resolution limits for direct write lithography

Year: 2025

Type: conference-paper

Source: SPIE Novel Patterning Technologies

DOI: 10.1117/12.3052656

Authors: Matthias Wahl, Steffen Diez, Sven Preuss, Benedikt Stender, Emine Cagin, Holger Sailer, Angela Schneider, Gregg Moore

Institution: Institut für Mikroelektronik Stuttgart

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4407833402

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