Work

AFM metrology for 3D high aspect ratio semiconductor structures

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3054048

Authors: Hokyun Chin, ShihWei Yu, Lucas Rencker, Omid Tajalizadehkhoob, Khalid El Maghawry Elsayed, Po-Cheng Wu, Duygu Akbulut, Niranjan Saikumar, Hamed Sadeghian

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4407833410

FWCI: 2.358

Cites: 2

Cited by: 1

Related to: 10