Accurate process window determination for EUV lithography using large field of view eBeam metrology and stochastic-aware modeling
Year: 2025
Type: conference-paper
DOI: 10.1117/12.3051560
Authors: Su-Te Ma, Chih-Ping Chang, Yi-Yi Chen, Yen-Lung Lu, Teng-Yen Huang, Hepeng Ding, Sangyoon Shim, Zehua Han, Franklin Wong, Guanchen He, Selena Chen, Luke Lin, Chih-Hung Hsieh
Institutions: Nanya Technology (Taiwan), ASML (United States)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4407833497