Work

ASR adoption as a holistic monitor solution in DRAM technology

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051685

Authors: JangChen Chang, Ya Hsuan Chen, Pei Ying Lai, Guan-Cheng Li, Yun-Chen Wu, Guan-Yi Kuo, Ken-Huan Ho, Yu-Yao Y. A. Wang, Chun-Wei Chen, Koen Thuijs, Aert Stutvoet, Chien-Ching Wu, Carina Riberio Barbio Correa, Sofiia Venglovska

Institutions: Nanya Technology (Taiwan), ASML (Netherlands)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4407833514

FWCI:

Cites: 3

Cited by:

Related to: 10