Work

Characterization of pattern fidelity evaluation using sine wave patterns in electron multi-beam writing

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051215

Authors: Shinichi Sasaki, Hikari Ogawa, Makoto Kawano, Aki Saito, Takuma Abe, Mitsuko Nishijima, Yoshiyuki Negishi, Hideki Matsui, Yoshinori Kojima

Institution: Nuflare Technology, Inc. (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4407833652

FWCI:

Cites: 4

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Related to: 10