Work

In-situ investigation of as-cast homopolymer-based resists

Year: 2025

Type: conference-abstract

DOI: 10.1117/12.3054671

Authors: Markus Langner, Gregrey B. Swieca, Michael J. Eller, Won-Il Lee, Shixian Ha, Nikhil M. Tiwale, Chang-Yong Nam

Institutions: California State University, Northridge, Brookhaven National Laboratory, Stony Brook University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4407833840

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