Optimization of defect detection sensitivity and cost of ownership reduction in nano imprint lithography through design for inspection and advanced optical inspection
Year: 2025
Type: conference-paper
DOI: 10.1117/12.3051318
Authors: Gilad Reut, Oded Ovdat, Oren Cohen, Shay Yasharzade, Liran Zacs, Inbar Kolsky, Harel Ilan, Shingo Ishida, Tomohiro Saito, Asahi Sawasato, Yuki Kawabe, Shinsuke Mizuno
Institutions: Applied Materials (Israel), Canon (Japan)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4407833868