Work

Process sensitivity analysis for EPE optimization of MP18 SALELE BEOL patterning

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051089

Authors: Assawer Soussou, Luka Kljucar, Mircea Dusa, Tom Mountsier, Gosia Jurczak, Brett Lowe

Institutions: IMEC, Lam Research (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4407833969

FWCI:

Cites: 3

Cited by:

Related to: 10