Work

Improving throughput of two-beam interference lithography using narrow-bandwidth nanosecond pulsed laser

Year: 2025

Type: conference-paper

Source: SPIE Novel Patterning Technologies

DOI: 10.1117/12.3051249

Authors: Kohei Toyoda, Yohei Nawaki, Kota Hiroshima, Shinji Orihara, Hirotaka Yamada, Makoto Wasamoto, Keisuke Ota, Kazuyuki Tsuruoka

Institution: Ushio (Japan)

Language: English

Topic: Optical Coatings and Gratings

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4407834564

FWCI: 8.742

Cites: 2

Cited by: 1

Related to: 10