Work

Compensation of lens aberration induced overlay by computational metrology

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051559

Authors: Alessandro Vaglio Pret, Philip Groeger, Clemens Utzny, Gaetan De Liedekerke Beaufort, Patrick Lomtscher, Roel Gronheid, Mingyu Kim, Minsung Hyun, Sunny Kim, Anatoly Burov, Mark D. Smith

Institution: KLA (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4407835156

FWCI: 2.277

Cites: 12

Cited by: 1

Related to: 10