Novel 2D high-NA EUV pattern fidelity monitoring
Year: 2025
Type: conference-paper
DOI: 10.1117/12.3053210
Authors: Anowar H. Khan, Alex Danilevsky, Khiam Chew, Aaron J. Blattner, Jinnie Aloysius, Nazia Nafsin, Ryuji Mitsuhashi, Masaaki Kikuchi
Institutions: Intel (United States), Hitachi High-Tech (Japan)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4407895753