Soft Sputtering of Large‐Area 2D MoS2 Layers Using Isolated Plasma Soft Deposition for Humidity Sensors (Adv. Mater. 8/2025)
Year: 2025
Type: article
Abstract: Soft Sputtering of Large-Area 2D MoS2 Layers The hand-painted image depicts a 6-inch silicon wafer, coated with a 2D MoS2 semiconductor by IPSD, mounted on a canvas. The oil painting, created by Professor H.-K. Kim, illustrates isolated plasma confined within strong magnetic fields. This plasma environment enables the deposition of MoS2 molecules, resulting in the formation of a uniform 2D layer on the silicon wafer. More details can be found in article number 2414800 by Han-Ki Kim and co-workers.
Source: Advanced Materials
Authors: Hye‐Young Youn, Tae‐Yang Choi, Junoh Shim, Se Young Park, Min‐Ki Kwon, Sunkook Kim, Han‐Ki Kim
Institutions: Sungkyunkwan University, Chosun University
Language: English
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: bronze
OpenAlex ID: W4407929607