A holistic lithography approach to wafer edge overlay control
Year: 2025
Type: conference-paper
DOI: 10.1117/12.3051783
Authors: Chien Ting Lin, Kie-Dong Chen, Wei-Hao Zhao, Chun-Yen Wei, Tzu-Yu Chou, Cheng-Wei Yang, Peggy Lai, Jordi Griera Tapia, Chien-Ching Wu, Gijs van Lookeren Campagne, Patrick Bintevinos, Chung-Tien Li, Robin Tijssen, Shahrzad Naghibzadeh
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4408047069