Work

Control of Mask Erosion and Correction of Structure Profile in an Adapted Process of Deep Reactive Ion Etching of Silicon

Year: 2024

Type: article

Source: Journal of Surface Investigation X-ray Synchrotron and Neutron Techniques

DOI: 10.1134/s102745102470126x

Author: O. V. Morozov

Institutions: Russian Academy of Sciences, Institute of Physics and Technology

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4408075904

FWCI: 0.416

Cites: 35

Cited by: 4

Related to: 10