Work

Spatial atomic layer deposition: Transport-reaction modeling and experimental validation of film geometry

Year: 2025

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/6.0004367

Authors: Daniel Penley, Neil P. Dasgupta

Institution: University of Michigan

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Science Foundation

Awards: CAREER: Rational Design and Manufacturing of Nanostructured Surfaces and Interfaces in Lightweight Materials, FMRG: Cyber: Manufacturing USA: Manufacturing of Next-Generation Perovskite Semiconductors at Scale

OpenAlex ID: W4408163397

FWCI: 0.231

Cites: 61

Cited by: 1

Related to: 10